@article {Grenci201513,
	title = {High resolution spin-on electron beam lithography resist with exceptional dry etching resistance},
	journal = {Applied Materials Today},
	volume = {1},
	number = {1},
	year = {2015},
	note = {cited By 0},
	pages = {13-19},
	doi = {10.1016/j.apmt.2015.06.003},
	url = {http://www.scopus.com/inward/record.url?eid=2-s2.0-84945268077&partnerID=40&md5=7520051be8ef0c4516b0f7b1735f7ea4},
	author = {Grenci, G. and Zanchetta, E. and Pozzato, A. and Della Giustina, G. and Brusatin, G. and Tormen, M.}
}
