Analytical Laboratory
Analytical Laboratory
Contact: Cinzia Cepek
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The laboratory consists of an ultra high vacuum (UHV) experimental apparatus (base pressure: ˜ 4x10 -11 mbar), equipped with instrumentation devoted to the growth and to the study of the chemical composition, electronic structure and atomic arrangement of surfaces and thin films. The mainly studied systems in the last years are nanostructured carbon- based materials, like fullerenes, CNTs, graphene, porous nanostructured carbon, etc... |
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The available experimental analysis techniques are ultra-violet and X-ray photoemission spectroscopy (UPS and XPS), Auger electron spectroscopy, electron energy loss spectroscopy (EELS) and low energy electron diffraction (LEED). The thin film growth instrumentations include several UHV evaporators for molecular beam epitaxy, many gas lines for chemical vapour deposition (CVD), a plasma enhanced chemical vapour deposition reactor (PECVD) and a supersonic cluster beam source. All the above systems are directly connected with the UHV chamber, enabling the in-situ study via electron spectroscopy just after the growth of the samples, avoiding any possible contribution due to atmospheric contamination. A sizeable part of the work of the group is performed via access to international synchrotron radiation facilities.
Part of the main Research Activity is devoted to the growth and characterization od Nano Carbon Based Materials. Please see here for more details.
