High resolution spin-on electron beam lithography resist with exceptional dry etching resistance
| Title | High resolution spin-on electron beam lithography resist with exceptional dry etching resistance |
| Publication Type | Journal Article |
| Year of Publication | 2015 |
| Authors | Grenci, G, Zanchetta, E, Pozzato, A, G. Giustina, D, Brusatin, G, Tormen, M |
| Journal | Applied Materials Today |
| Volume | 1 |
| Pagination | 13-19 |
| URL | http://www.scopus.com/inward/record.url?eid=2-s2.0-84945268077&partnerID=40&md5=7520051be8ef0c4516b0f7b1735f7ea4 |
| DOI | 10.1016/j.apmt.2015.06.003 |
