Novel Hybrid Organic-Inorganic Spin-on Resist for Electron- or Photon-Based Nanolithography with Outstanding Resistance to Dry Etching

TitleNovel Hybrid Organic-Inorganic Spin-on Resist for Electron- or Photon-Based Nanolithography with Outstanding Resistance to Dry Etching
Publication TypeJournal Article
Year of Publication2013
AuthorsZanchetta, E, Giustina, GDella, Grenci, G, Pozzato, A, Tormen, M, Brusatin, G
JournalAdvanced Materials
Volume25
Pagination6261–6265
Date Publishednov
DOI10.1002/adma.201301555